Brooks Instrument”s DLI Vaporizer solution is designed to deliver chemically pure vapor in most applications and can accept multiple liquid inlets to generate mixed vapors. Vaporizer designs provide 100 percent vaporization and repeatable, uniform, particle-free films. Vaporizers can mix up to three fluid streams and are robust enough to handle low vapor pressure and thermally sensitive fluids. With a dynamic flow range of less than 10 grams/hr to greater than 10 kg/hr and Coriolis-based mass flow control, these vaporizers offer a superior solution compared to typical flash vaporizers and bubbler (vapor draw) systems and have been proven in many applications such as chemical vapor deposition (CVD), metal oxide chemical vapor deposition (MOCVD), advanced material deposition in the semiconductor industry, vaporizing monomers for vacuum polymer film deposition, creating thin films for enhanced thermal, optical, or hardness characteristics (e.g. Diamond-like coatings), and generating calibration vapor for continuous emission monitoring systems.