Emerson Process Management (www.emersonprocess.com) reached an agreement with MSP Corporation (www.mspcorp.com) to incorporate Brooks Instrument (www.brooksinstrument.com) flow control technologies into the design of the MSP Model 2800 Turbo-Vaporizer, giving the product the ability to precisely deposit hafnium-based, high-k dielectric films in commercial DRAM production. The deal also gives Brooks distribution rights over the integrated product in the United States and Japan.
The system can be used to vaporize precursors needed in the semiconductor industry to create advanced films. It is a direct liquid injection (DLI) vaporizer that uses fine droplet technology to vaporize temperature-sensitive liquid precursor chemicals. It offers low particulate formation and is resistant to degraded film quality, contaminated wafers, loss of product yield, and unreliable vaporizer operation.
The vaporizer uses a Brooks QUANTIM Coriolis mass flow controller for delivery of precursor liquids and a Brooks thermal mass flow controller (MFC) for the carrier gas assist system. The Coriolis sensor at the heart of the QUANTIM flow controller measures fluid mass directly, independent of the physical properties of the fluid, making it capable of supporting a wide range of liquid precursors.
— Flow Control Staff
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Courtesy of Flow Research
